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Subject:
From:
Christopher Whittle <[log in to unmask]>
Reply To:
Museum discussion list <[log in to unmask]>
Date:
Tue, 16 Apr 1996 10:45:01 -0600
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The 4/96 issue of NASA Tech Briefs describes a technique for removing
varnish and lacquer from paintings using an atomic oxygen plasma.  The
article states that the new technique is less destructive than current
techniques.  Contact: Patent Counsel, Lewis Research Center, 216-433-2320
refer to LEW-16031.

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